Open access peer-reviewed chapter

Silicon Oxide Films Containing Amorphous or Crystalline Silicon Nanodots for Device Applications

By Diana Nesheva, Nikola Nedev, Mario Curiel, Irina Bineva, Benjamin Valdez and Emil Manolov

Submitted: May 9th 2011Reviewed: November 14th 2011Published: April 4th 2012

DOI: 10.5772/35122

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Diana Nesheva, Nikola Nedev, Mario Curiel, Irina Bineva, Benjamin Valdez and Emil Manolov (April 4th 2012). Silicon Oxide Films Containing Amorphous or Crystalline Silicon Nanodots for Device Applications, Quantum Dots - A Variety of New Applications, Ameenah Al-Ahmadi, IntechOpen, DOI: 10.5772/35122. Available from:

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