Open access peer-reviewed chapter

Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas

By Hitoshi Habuka

Downloaded: 3214

Published: April 4th 2011

How to cite and reference

Link to this chapter Copy to clipboard

Cite this chapter Copy to clipboard

Hitoshi Habuka (April 4th 2011). Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas, Properties and Applications of Silicon Carbide Rosario Gerhardt, IntechOpen, DOI: 10.5772/14635. Available from:

Embed this chapter on your site Copy to clipboard

<iframe src="http://www.intechopen.com/embed/properties-and-applications-of-silicon-carbide/low-temperature-chemical-vapour-deposition-of-polycrystalline-silicon-carbide-film-using-monomethyls" />

Embed this code snippet in the HTML of your website to show this chapter

chapter statistics

3214total chapter downloads

More statistics for editors and authors

Login to your personal dashboard for more detailed statistics on your publications.

Access personal reporting

Related Content

This Book

Next chapter

Growth Rate Enhancement of Silicon-Carbide Oxidation in Thin Oxide Regime

By Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida

Related Book

First chapter

The Fundamental Physics of Electromagnetic Waves

By Juliana H. J. Mortenson

We are IntechOpen, the first native scientific publisher of Open Access books. Our readership spans scientists, professors, researchers, librarians, and students, as well as business professionals. We share our knowledge and peer-reveiwed research papers with libraries, scientific and engineering societies, and also work with corporate R&D departments and government entities.

+3,350 Open Access Books

+57,400 Citations in Web of Science

+107,500 IntechOpen Authors and Academic Editors

+560,000 Unique visitors per month

More about us