Open access peer-reviewed chapter

Application of Molecular Dynamics Simulations to Plasma Etch Damage in Advanced Metal-Oxide-Semiconductor Field-Effect Transistors

By Koji Eriguchi

Submitted: May 23rd 2011Reviewed: November 28th 2011Published: April 11th 2012

DOI: 10.5772/36394

Downloaded: 2330

© 2012 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Koji Eriguchi (April 11th 2012). Application of Molecular Dynamics Simulations to Plasma Etch Damage in Advanced Metal-Oxide-Semiconductor Field-Effect Transistors, Molecular Dynamics Lichang Wang, IntechOpen, DOI: 10.5772/36394. Available from:

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