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Vanadium Oxide Thin Films Obtained by Thermal Annealing of Layers Deposited by RF Magnetron Sputtering at Room Temperature

By Hernan M. R. Giannetta, Carlos Calaza, Liliana Fraigi and Luis Fonseca

Submitted: June 6th 2016Reviewed: November 24th 2016Published: March 8th 2017

DOI: 10.5772/67054

Downloaded: 957

© 2017 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Hernan M. R. Giannetta, Carlos Calaza, Liliana Fraigi and Luis Fonseca (March 8th 2017). Vanadium Oxide Thin Films Obtained by Thermal Annealing of Layers Deposited by RF Magnetron Sputtering at Room Temperature, Modern Technologies for Creating the Thin-film Systems and Coatings Nikolay N. Nikitenkov, IntechOpen, DOI: 10.5772/67054. Available from:

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