Open access peer-reviewed chapter

Molecular Precursor Method for Fabricating p-Type Cu2O and Metallic Cu Thin Films

By Hiroki Nagai and Mitsunobu Sato

Submitted: June 7th 2016Reviewed: October 22nd 2016Published: March 8th 2017

DOI: 10.5772/66476

Downloaded: 1104

© 2017 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Hiroki Nagai and Mitsunobu Sato (March 8th 2017). Molecular Precursor Method for Fabricating p-Type Cu2O and Metallic Cu Thin Films, Modern Technologies for Creating the Thin-film Systems and Coatings Nikolay N. Nikitenkov, IntechOpen, DOI: 10.5772/66476. Available from:

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