Open access peer-reviewed Edited Volume

Micro/Nanolithography

A Heuristic Aspect on the Enduring Technology

The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.

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Micro/NanolithographyA Heuristic Aspect on the Enduring TechnologyEdited by Jagannathan Thirumalai

Published: May 2nd 2018

DOI: 10.5772/intechopen.68234

ISBN: 978-1-78923-031-4

Print ISBN: 978-1-78923-030-7

eBook (PDF) ISBN: 978-1-83881-293-5

Copyright year: 2018

Books open for chapter submissions

2693 Total Chapter Downloads

2 Crossref Citations

2 Dimensions Citations

chaptersDownloads

Open access peer-reviewed

1. Introductory Chapter: The Eminence of Lithography—New Horizons of Next-Generation Lithography

By Jagannathan Thirumalai

274

Open access peer-reviewed

2. Fabrication and Replication of Periodic Nanopyramid Structures by Laser Interference Lithography and UV Nanoimprint Lithography for Solar Cells Applications

By Amalraj Peter Amalathas and Maan M. Alkaisi

504

Open access peer-reviewed

3. Large-Area Nanoimprint Lithography and Applications

By Hongbo Lan

713

Open access peer-reviewed

4. Micro/Nano Patterning on Polymers Using Soft Lithography Technique

By Sujatha Lakshminarayanan

385

Open access peer-reviewed

5. EUV/Soft X-Ray Interference Lithography

By Shumin Yang and Yanqing Wu

295

Open access peer-reviewed

6. Optical Proximity Correction (OPC) Under Immersion Lithography

By Ahmed Awad, Atsushi Takahashi and Chikaaki Kodaman

526

Edited Volume and chapters are indexed in

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  • CNKI

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