Open access peer-reviewed chapter

Three Dimensional Nanoimprint Lithography Using Inorganic Electron Beam Resist

By Jun Taniguchi and Noriyuki Unno

Published: February 1st 2010

DOI: 10.5772/8193

Downloaded: 2367

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Jun Taniguchi and Noriyuki Unno (February 1st 2010). Three Dimensional Nanoimprint Lithography Using Inorganic Electron Beam Resist, Lithography Michael Wang, IntechOpen, DOI: 10.5772/8193. Available from:

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