Open access peer-reviewed chapter

Improving the Efficiency of Pattern Extraction for Character Projection Lithography using OPC Optimization

By Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa and Tetsuya Higuchi

Published: February 1st 2010

DOI: 10.5772/8171

Downloaded: 1243

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Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa and Tetsuya Higuchi (February 1st 2010). Improving the Efficiency of Pattern Extraction for Character Projection Lithography using OPC Optimization, Lithography Michael Wang, IntechOpen, DOI: 10.5772/8171. Available from:

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