Open access peer-reviewed chapter

High-energy Electron Beam Lithography for Nanoscale Fabrication

By Cen Shawn Wu, Yoshiyuki Makiuchi and ChiiDong Chen

Published: February 1st 2010

DOI: 10.5772/8179

Downloaded: 6490

© 2010 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution-NonCommercial-ShareAlike-3.0 License, which permits use, distribution and reproduction for non-commercial purposes, provided the original is properly cited and derivative works building on this content are distributed under the same license.

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Cen Shawn Wu, Yoshiyuki Makiuchi and ChiiDong Chen (February 1st 2010). High-energy Electron Beam Lithography for Nanoscale Fabrication, Lithography Michael Wang, IntechOpen, DOI: 10.5772/8179. Available from:

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