Open access peer-reviewed chapter

High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure

By Yoshinonori Matsumoto

Published: February 1st 2010

DOI: 10.5772/8168

Downloaded: 3562

How to cite and reference

Link to this chapter Copy to clipboard

Cite this chapter Copy to clipboard

Yoshinonori Matsumoto (February 1st 2010). High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure, Lithography Michael Wang, IntechOpen, DOI: 10.5772/8168. Available from:

Embed this chapter on your site Copy to clipboard

<iframe src="http://www.intechopen.com/embed/lithography/high-aspect-ratio-sloping-and-curved-structures-fabricated-by-proximity-and-uv-led-backside-exposure" />

Embed this code snippet in the HTML of your website to show this chapter

chapter statistics

3562total chapter downloads

More statistics for editors and authors

Login to your personal dashboard for more detailed statistics on your publications.

Access personal reporting

Related Content

This Book

Next chapter

Influence of Immersion Lithography on Wafer Edge Defectivity

By K. Jami, I. Pollentier, S. Vedula and G. Blumenstock

Related Book

We are IntechOpen, the world's leading publisher of Open Access books. Built by scientists, for scientists. Our readership spans scientists, professors, researchers, librarians, and students, as well as business professionals. We share our knowledge and peer-reveiwed research papers with libraries, scientific and engineering societies, and also work with corporate R&D departments and government entities.

More about us