Open access peer-reviewed chapter

Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction

By R. C. Fadanelli, M. Behar and J. F. Dias

Submitted: May 13th 2011Reviewed: October 24th 2011Published: May 30th 2012

DOI: 10.5772/35696

Downloaded: 1522

© 2012 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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R. C. Fadanelli, M. Behar and J. F. Dias (May 30th 2012). Coulomb Heating Behaviour of Fast Light Diclusters in Si&lt;100&gt; Direction, Ion Implantation, Mark Goorsky, IntechOpen, DOI: 10.5772/35696. Available from:

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