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Thickness Measurement of Photoresist Thin Films Using Interferometry

Written By

Fotis Kossivas, Charalabos Doumanidis and Andreas Kyprianou

Submitted: 06 May 2011 Published: 21 March 2012

DOI: 10.5772/34983

From the Edited Volume

Interferometry - Research and Applications in Science and Technology

Edited by Ivan Padron

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Written By

Fotis Kossivas, Charalabos Doumanidis and Andreas Kyprianou

Submitted: 06 May 2011 Published: 21 March 2012