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Atomic Layer Deposition of High-k Oxides on Graphene

By Harry Alles, Jaan Aarik, Jekaterina Kozlova, Ahti Niilisk, Raul Rammula and Väino Sammelselg

Submitted: November 10th 2010Reviewed: April 20th 2011Published: September 15th 2011

DOI: 10.5772/20801

Downloaded: 2902

© 2011 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution-NonCommercial-ShareAlike-3.0 License, which permits use, distribution and reproduction for non-commercial purposes, provided the original is properly cited and derivative works building on this content are distributed under the same license.

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Harry Alles, Jaan Aarik, Jekaterina Kozlova, Ahti Niilisk, Raul Rammula and Väino Sammelselg (September 15th 2011). Atomic Layer Deposition of High-k Oxides on Graphene, Graphene Jian Ru Gong, IntechOpen, DOI: 10.5772/20801. Available from:

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