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Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments

By Le Van Hai, Takeshi Kanashima and Masanori Okuyama

Submitted: October 19th 2010Reviewed: April 18th 2011Published: August 24th 2011

DOI: 10.5772/17106

Downloaded: 1609

© 2011 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution-NonCommercial-ShareAlike-3.0 License, which permits use, distribution and reproduction for non-commercial purposes, provided the original is properly cited and derivative works building on this content are distributed under the same license.

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Le Van Hai, Takeshi Kanashima and Masanori Okuyama (August 24th 2011). Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments, Ferroelectrics Mickaël Lallart, IntechOpen, DOI: 10.5772/17106. Available from:

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