Open access peer-reviewed chapter

Electrical Characterization of High-K Dielectric Gates for Microelectronic Devices

By Salvador Dueñas, Helena Castán, Héctor García and Luis Bailón

Submitted: November 15th 2011Reviewed: June 6th 2012Published: October 3rd 2012

DOI: 10.5772/50399

Downloaded: 5466

© 2012 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Salvador Dueñas, Helena Castán, Héctor García and Luis Bailón (October 3rd 2012). Electrical Characterization of High-K Dielectric Gates for Microelectronic Devices, Dielectric Material Marius Alexandru Silaghi, IntechOpen, DOI: 10.5772/50399. Available from:

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