Open access peer-reviewed chapter

Improving Performance and Reliability of MOS Devices Using Deuterium Implantation

By Jae-Sung Lee

Published: March 1st 2010

DOI: 10.5772/8856

Downloaded: 4658

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Jae-Sung Lee (March 1st 2010). Improving Performance and Reliability of MOS Devices Using Deuterium Implantation, Cutting Edge Nanotechnology, Dragica Vasileska, IntechOpen, DOI: 10.5772/8856. Available from:

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