Open access peer-reviewed Edited Volume

Complementary Metal Oxide Semiconductor

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Academic Editor

Kim Ho Yeap
Kim Ho Yeap

Universiti Tunku Abdul Rahman,
Malaysia

Co-editor

Published01 August 2018

Doi10.5772/intechopen.71097

ISBN978-1-78923-497-8

Print ISBN978-1-78923-496-1

eBook (PDF) ISBN978-1-83881-512-7

Copyright year2018

Number of pages160

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Edited Volume and chapters are indexed in

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  • DOAB
  • Crossref
  • Dimension
  • OpenAIRE
  • AZ ebsco
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Table of Contents

Open access  chapters

2,121
2
3. Work Function Setting in High-k Metal Gate Devices

By Elke Erben, Klaus Hempel and Dina Triyoso

3,438
3
4. Selective Epitaxy of Group IV Materials for CMOS Application

By Guilei Wang, Henry H. Radamson and Mohammadreza Kolahdouz

2,233
5. MOS Meets NEMS: The Born of Hybrid Devices

By Mario Alberto García-Ramírez, Miguel Angel Bello-Jiménez, María Esther Macías-Rodríguez, Barbara Cortese, José Trinidad Guillen- Bonilla, Rosa Elvia López-Estopier, Juan Carlos Gutiérrez-García and Everardo Vargas-Rodríguez

1,217
1,331
1,783
2

IMPACT OF THIS BOOK AND ITS CHAPTERS

14,890 Total Chapter Downloads

3,190 Total Chapter Views

10 Crossref Citations

2 Web of Science Citations

19 Dimensions Citations

22 Altmetric Score

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