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Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources

By J. Alarcón-Salazar, R. López-Estopier, E. Quiroga-González, A. Morales-Sánchez, J. Pedraza-Chávez, I. E. Zaldívar-Huerta and M. Aceves-Mijares

Submitted: November 12th 2015Reviewed: March 10th 2016Published: August 31st 2016

DOI: 10.5772/63012

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© 2016 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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J. Alarcón-Salazar, R. López-Estopier, E. Quiroga-González, A. Morales-Sánchez, J. Pedraza-Chávez, I. E. Zaldívar-Huerta and M. Aceves-Mijares (August 31st 2016). Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources, Chemical Vapor Deposition Sudhir Neralla, IntechOpen, DOI: 10.5772/63012. Available from:

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