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Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future

By Yasaman Hamedani, Prathyushakrishna Macha, Timothy J. Bunning, Rajesh R. Naik and Milana C. Vasudev

Submitted: November 9th 2015Reviewed: June 20th 2016Published: August 31st 2016

DOI: 10.5772/64654

Downloaded: 2390

© 2016 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Yasaman Hamedani, Prathyushakrishna Macha, Timothy J. Bunning, Rajesh R. Naik and Milana C. Vasudev (August 31st 2016). Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future, Chemical Vapor Deposition Sudhir Neralla, IntechOpen, DOI: 10.5772/64654. Available from:

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