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High‐Density Plasma‐Enhanced Chemical Vapor Deposition of Si‐Based Materials for Solar Cell Applications

By H. P. Zhou, S. Xu and S. Q. Xiao

Submitted: November 11th 2015Reviewed: April 8th 2016Published: August 31st 2016

DOI: 10.5772/63529

Downloaded: 667

© 2016 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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H. P. Zhou, S. Xu and S. Q. Xiao (August 31st 2016). High‐Density Plasma‐Enhanced Chemical Vapor Deposition of Si‐Based Materials for Solar Cell Applications, Chemical Vapor Deposition Sudheer Neralla, IntechOpen, DOI: 10.5772/63529. Available from:

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