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Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

By Ramasamy Pothiraja, Nikita Bibinov and Peter Awakowicz

Submitted: May 26th 2011Reviewed: November 14th 2011Published: February 29th 2012

DOI: 10.5772/36779

Downloaded: 2680

© 2012 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution 3.0 License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Ramasamy Pothiraja, Nikita Bibinov and Peter Awakowicz (February 29th 2012). Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions, Chemical Kinetics, Vivek Patel, IntechOpen, DOI: 10.5772/36779. Available from:

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