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Monte Carlo Simulation for Ion Implantation Profiles, Amorphous Layer Thickness Formed by the Ion Implantation, and Database Based on Pearson Function

By Kunihiro Suzuki

Submitted: May 26th 2010Reviewed: August 30th 2010Published: February 28th 2011

DOI: 10.5772/14539

Downloaded: 4381

© 2011 The Author(s). Licensee IntechOpen. This chapter is distributed under the terms of the Creative Commons Attribution-NonCommercial-ShareAlike-3.0 License, which permits use, distribution and reproduction for non-commercial purposes, provided the original is properly cited and derivative works building on this content are distributed under the same license.

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Kunihiro Suzuki (February 28th 2011). Monte Carlo Simulation for Ion Implantation Profiles, Amorphous Layer Thickness Formed by the Ion Implantation, and Database Based on Pearson Function, Applications of Monte Carlo Method in Science and Engineering Shaul Mordechai, IntechOpen, DOI: 10.5772/14539. Available from:

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