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Monte Carlo Simulation for Ion Implantation Profiles, Amorphous Layer Thickness Formed by the Ion Implantation, and Database Based on Pearson Function

By Kunihiro Suzuki

Submitted: May 26th 2010Reviewed: August 30th 2010Published: February 28th 2011

DOI: 10.5772/14539

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Kunihiro Suzuki (February 28th 2011). Monte Carlo Simulation for Ion Implantation Profiles, Amorphous Layer Thickness Formed by the Ion Implantation, and Database Based on Pearson Function, Applications of Monte Carlo Method in Science and Engineering, Shaul Mordechai, IntechOpen, DOI: 10.5772/14539. Available from:

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