Open access peer-reviewed chapter

Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics

By Igor K. Igumenov, Tamara V. Basova and Vladimir R. Belosludov

Submitted: April 28th 2010Published: January 14th 2011

DOI: 10.5772/13356

Downloaded: 3425

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Igor K. Igumenov, Tamara V. Basova and Vladimir R. Belosludov (January 14th 2011). Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics, Application of Thermodynamics to Biological and Materials Science, Mizutani Tadashi, IntechOpen, DOI: 10.5772/13356. Available from:

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