Lithography,  ISBN: 978-953-307-064-3

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

By Katia Vutova and Georgi Mladenov

DOI: 10.5772/8183



Published online: 01. February, 2010.
Published in print edition: February, 2010.


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Fig. 2. Number of chapter downloads in the last six months by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Fig. 3. Pie chart shows the download share by country. The countries represented are the TOP 5 countries from which this paper was accessed.



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Unknown555