Lithography,  ISBN: 978-953-307-064-3

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

By Katia Vutova and Georgi Mladenov

DOI: 10.5772/8183



Published online: 01. February, 2010.
Published in print edition: February, 2010.


Fig. 1. Accumulated download share in the last six months. The time period is defined from the publication date up to today.



Fig. 2. Number of chapter downloads in the last six months by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Fig. 3. Pie chart shows the download share by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Downloads per country


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Unknown563