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Lithography,  ISBN: 978-953-307-064-3

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

By Katia Vutova and Georgi Mladenov

DOI: 10.5772/8183



Published online: 01. February, 2010.
Published in print edition: February, 2010.


Fig. 1. Accumulated download share in the last six months. The time period is defined from the publication date up to today.



Fig. 2. Number of chapter downloads in the last six months by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Fig. 3. Pie chart shows the download share by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Downloads per country


CountryDownloads
United States of America1091
China365
India202
Taiwan180
Germany156
Japan155
Korea, Republic of117
Russian Federation112
France103
United Kingdom95
Canada75
Poland60
Italy59
Turkey50
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Slovenia47
Spain45
Vietnam40
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Singapore37
Netherlands35
Indonesia35
Algeria35
Brazil33
Lebanon32
Asia/Pacific Region30
Mexico30
Romania30
Austria27
Egypt27
Malaysia26
Belgium26
Ireland26
Australia24
Europe22
Sweden21
Pakistan20
Greece19
Bulgaria18
Portugal18
Serbia17
Israel16
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Ukraine11
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Lithuania9
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Latvia4
Jordan4
Iraq4
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Tonga3
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Albania3
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Holy See3
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Turks and Caicos Islands3
Tunisia3
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Macedonia3
Bosnia and Herzegovina3
Congo, Republic of the3
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Namibia3
Sri Lanka3
Macau3
Zimbabwe3
Moldova3
Georgia3
Ghana3
Tajikistan3
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Solomon Islands3
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Ecuador2
Grenada2
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Russia2
Guinea2
Belize2
Trinidad and Tobago2
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Guyana2
Cuba2
Samoa2
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Haiti1
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Iran1
Palestinian Territory1
Angola1
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Reunion1
Paraguay1
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Bhutan1
Cape Verde1
Barbados1
Greenland1
Liechtenstein1
Iceland1
Palestine1
Unknown605