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Lithography,  ISBN: 978-953-307-064-3

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

By Katia Vutova and Georgi Mladenov

DOI: 10.5772/8183



Published online: 01. February, 2010.
Published in print edition: February, 2010.


Fig. 1. Accumulated download share in the last six months. The time period is defined from the publication date up to today.



Fig. 2. Number of chapter downloads in the last six months by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Fig. 3. Pie chart shows the download share by country. The countries represented are the TOP 5 countries from which this paper was accessed.



Downloads per country


CountryDownloads
United States of America1127
China369
India204
Taiwan180
Germany157
Japan156
Korea, Republic of117
Russian Federation112
France107
United Kingdom96
Canada75
Poland60
Italy59
Turkey50
Spain50
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Slovenia47
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Croatia40
Singapore37
Algeria35
Netherlands35
Indonesia35
Brazil34
Lebanon32
Mexico30
Romania30
Asia/Pacific Region30
Austria27
Egypt27
Belgium26
Ireland26
Malaysia26
Europe24
Australia24
Sweden21
Pakistan20
Greece19
Portugal18
Bulgaria18
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Hong Kong13
Denmark13
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Slovakia10
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Lithuania9
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Jordan4
Iraq4
Peru4
Sierra Leone4
Cameroon4
Finland4
Latvia4
Uruguay3
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Eritrea3
Macedonia3
Bosnia and Herzegovina3
Congo, Republic of the3
Rwanda3
Oman3
Namibia3
Sri Lanka3
Macau3
Zimbabwe3
Moldova3
Georgia3
Ghana3
Tajikistan3
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Solomon Islands3
Andorra3
Estonia3
Martinique3
Venezuela3
Tonga3
Somalia3
Albania3
Botswana3
Bolivia3
Holy See3
Turks and Caicos Islands3
Congo, Democratic Republic of the3
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Djibouti2
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Saint Kitts and Nevis2
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El Salvador2
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Samoa2
Sudan2
Lesotho2
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Iran1
Angola1
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Greenland1
Liechtenstein1
Palestine1
Iceland1
Dominica1
Suriname1
Myanmar1
Uganda1
Papua New Guinea1
Tanzania1
Faroe Islands1
Zambia1
Mongolia1
Togo1
French Guiana1
San Marino1
Benin1
Malawi1
Nicaragua1
Monaco1
Cayman Islands1
Liberia1
Korea, South1
Burkina Faso1
Unknown606