Uday Dadwal
Dr. Uday Dadwal is currently a technical officer at the Nanoscale Research Facility (NRF), Indian Institute of Technology Delhi (IIT Delhi), New Delhi, India. He obtained an MSc in Physics from Jiwaji University, Gwalior, India, in 2005. He obtained a Ph.D. from the Centre for Applied Research in Electronics, IIT Delhi in 2013 with work related to the investigation of blistering and exfoliation phenomena in hydrogen-implanted semiconductors. After obtaining his Ph.D., Dr. Dadwal became a project scientist at the NRF. He was involved in the setting up of state-of-the-art nanofabrication facilities in the class-100 and class-1000 clean rooms such as electron beam lithography, maskless photolithography, atomic layer deposition, reactive ion etching, oxidation furnace, and chemical vapor deposition. He was also involved in the growth of semiconductor nanostructures for water-splitting applications. His research has focused on layer-splitting studies of wide-bandgap semiconductors including GaN and AlN, wafer bonding studies using hydrogen ion implantation, and growth and study of semiconductor nanostructures for water-splitting applications.