Materials Science » Semiconductors » "Ion Implantation", book edited by Mark Goorsky, ISBN 978-953-51-0634-0, Published: May 30, 2012 under CC BY 3.0 license. © The Author(s).

Chapter 2

Radio Frequency Quadrupole Accelerator: A High Energy and High Current Implanter

By Yuancun Nie, Yuanrong Lu, Xueqing Yan and Jiaer Chen
DOI: 10.5772/33823