Materials Science » Semiconductors

Ion Implantation

Edited by Mark Goorsky, ISBN 978-953-51-0634-0, 448 pages, Publisher: InTech, Chapters published May 30, 2012 under CC BY 3.0 license
DOI: 10.5772/1881
Edited Volume

Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.